微流控芯片实验步骤及滤膜的选择
a three-dimensional origami paper-based device for potentiometricbiosensing
materials
2-nitrophenyl octyl ether (o-npoe), heptakis(2,3,6-tri-o-methyl)-β-cyclodextrin
(β-cd), sodium tetrakis[3,5-bis(trifluoromethyl)phenyl]borate (natfpb), poly
(methyl methacrylate-co-butyl methacrylate), high molecular weight poly(vinyl
chloride) (pvc) were purchased from fluka ag (buchs, switzerland).
butyrylthiocholine iodide was obtained from aladdin (shanghai, china). bovine
serum albumin (bsa), butyrylcholine chloride and 5,5′-dithiobis(2-nitrobenzoic acid)(dtnb) were obtained from sigma. butyrylcholinesterase (buche, 5.64 u mg-1) waspurchased from sangon (shanghai, china). methyl parathion (99%) was obtained
from best reagent (chengdu, china). carbon and ag/agcl inks (dispersed in vinisol)
were purchase from bohui new materials tech. co. ltd (jiangsu, china). all other
reagents used were purchased from sinopharm chemical reagent and of analytical
grade purity or better. freshly deionized water (18.2 mω cm specific resistance) wasobtained with a pall cascada laboratory water system.
membrane preparation
the butyrylcholine selective membranes contained 1.0 wt% natfpb, 1.0 wt% β-cd,
65.0 wt% o-npoe and 33.0 wt% pvc.1 200 mg of the membrane components were
dissolved in 1.0 ml of thf. the reference electrode membrane cocktail was prepared
as described before with some modifications. 200 mg of the copolymer, 68.0 mg of
kcl, and 5.0 mg of eth 500 were dispersed in 1.0 ml of thf.2 each deposited diskmembrane had a diameter of 4 mm. eth 500, as a kind of ionic liquid, was used todecrease the membrane resistance.
the stability of the reference membrane electrode was tested against a
commercial double-junction silver/silver chloride (3 m kcl) electrode, and an amountof 20 μl reference membrane cocktail was coated onto a silver/silver chloride inkscreen-printed electrode on a ceramic substrate.
chip fabrication
the fabrication process was performed following by our previously described
procedures.3 briefly, a xerox phaser 8560dn wax inkjet printer purchased from
fuji xerox company was used to pattern wax-based solid ink on the whatman
chromatography paper (whatman chromatography paper, ge) with highest
resolution 2400 dpi. the chip design was implemented using drawing software
(adobe illustrator). after printing, the paper was kept in an oven at 150 °c for 30second to let the wax to penetrate through the paper compley to form hydrophobicwax barriers and then cooled to 20 °c. the static water contact angle was measured atroom temperature by a contact angle system jgw-360b (chengde, china).measurements were repeated on at least three drops.
更多具体内容请查阅文件
微流控实验滤膜选择上海必泰生物科技有限公司销售经营的whatman的3001-861尺寸是20cm*20cm
硅片双面研磨加工技术研究的重要指导意义
德国KRACHT显示器AS8-I-230大量现货
捷斯曼控制器VV8LB36DKPA11-2ZP型相关技术介绍
H+L电磁阀WE04-4P100 ID.NR:THL.1136410
温泉打井的6个步骤
微流控芯片实验步骤及滤膜的选择
金属元素钼检测试剂操作流程分享
2017年12月FDA批出6个新药
瑞士vat 21.2系列泄压阀的压力调节方法
二手酱腌菜一体机*回收
纸尿裤吸收速度回渗测试仪-检测
化工厂防爆配电箱
余压监控系统+智慧消防等于城市消防安全的基石——乐鸟
如何正确使用功率表的方法
普通车床的正常使用必须满足如下条件
SRY6-3护套式电加热器主要特点
有一些因素会影响管道内窥镜的测量精准度
变频器过热维修故障原因分析与处理措施
乙烯基树脂防腐胶泥中温玻璃鳞片材料
影响激光粒度仪背景的因素
materials
2-nitrophenyl octyl ether (o-npoe), heptakis(2,3,6-tri-o-methyl)-β-cyclodextrin
(β-cd), sodium tetrakis[3,5-bis(trifluoromethyl)phenyl]borate (natfpb), poly
(methyl methacrylate-co-butyl methacrylate), high molecular weight poly(vinyl
chloride) (pvc) were purchased from fluka ag (buchs, switzerland).
butyrylthiocholine iodide was obtained from aladdin (shanghai, china). bovine
serum albumin (bsa), butyrylcholine chloride and 5,5′-dithiobis(2-nitrobenzoic acid)(dtnb) were obtained from sigma. butyrylcholinesterase (buche, 5.64 u mg-1) waspurchased from sangon (shanghai, china). methyl parathion (99%) was obtained
from best reagent (chengdu, china). carbon and ag/agcl inks (dispersed in vinisol)
were purchase from bohui new materials tech. co. ltd (jiangsu, china). all other
reagents used were purchased from sinopharm chemical reagent and of analytical
grade purity or better. freshly deionized water (18.2 mω cm specific resistance) wasobtained with a pall cascada laboratory water system.
membrane preparation
the butyrylcholine selective membranes contained 1.0 wt% natfpb, 1.0 wt% β-cd,
65.0 wt% o-npoe and 33.0 wt% pvc.1 200 mg of the membrane components were
dissolved in 1.0 ml of thf. the reference electrode membrane cocktail was prepared
as described before with some modifications. 200 mg of the copolymer, 68.0 mg of
kcl, and 5.0 mg of eth 500 were dispersed in 1.0 ml of thf.2 each deposited diskmembrane had a diameter of 4 mm. eth 500, as a kind of ionic liquid, was used todecrease the membrane resistance.
the stability of the reference membrane electrode was tested against a
commercial double-junction silver/silver chloride (3 m kcl) electrode, and an amountof 20 μl reference membrane cocktail was coated onto a silver/silver chloride inkscreen-printed electrode on a ceramic substrate.
chip fabrication
the fabrication process was performed following by our previously described
procedures.3 briefly, a xerox phaser 8560dn wax inkjet printer purchased from
fuji xerox company was used to pattern wax-based solid ink on the whatman
chromatography paper (whatman chromatography paper, ge) with highest
resolution 2400 dpi. the chip design was implemented using drawing software
(adobe illustrator). after printing, the paper was kept in an oven at 150 °c for 30second to let the wax to penetrate through the paper compley to form hydrophobicwax barriers and then cooled to 20 °c. the static water contact angle was measured atroom temperature by a contact angle system jgw-360b (chengde, china).measurements were repeated on at least three drops.
更多具体内容请查阅文件
微流控实验滤膜选择上海必泰生物科技有限公司销售经营的whatman的3001-861尺寸是20cm*20cm
硅片双面研磨加工技术研究的重要指导意义
德国KRACHT显示器AS8-I-230大量现货
捷斯曼控制器VV8LB36DKPA11-2ZP型相关技术介绍
H+L电磁阀WE04-4P100 ID.NR:THL.1136410
温泉打井的6个步骤
微流控芯片实验步骤及滤膜的选择
金属元素钼检测试剂操作流程分享
2017年12月FDA批出6个新药
瑞士vat 21.2系列泄压阀的压力调节方法
二手酱腌菜一体机*回收
纸尿裤吸收速度回渗测试仪-检测
化工厂防爆配电箱
余压监控系统+智慧消防等于城市消防安全的基石——乐鸟
如何正确使用功率表的方法
普通车床的正常使用必须满足如下条件
SRY6-3护套式电加热器主要特点
有一些因素会影响管道内窥镜的测量精准度
变频器过热维修故障原因分析与处理措施
乙烯基树脂防腐胶泥中温玻璃鳞片材料
影响激光粒度仪背景的因素